Semiconductor Inspection
ES20XP
KLA-Tencor E-Beam Wafer Inspection System
About this part
The eS20XP is a KLA-Tencor wafer inspection system introduced for high-sensitivity physical-defect detection and production-line monitoring of electrical defects in advanced semiconductor manufacturing. Electron-beam imaging detects physical defects, while voltage-contrast inspection identifies electrical failures. Charge-control technology supports charging-sensitive layers including silicon-on-insulator and low-k dielectrics
Configurations vary. Verify the exact unit before choosing a replacement.
Key Facts
Specifications
| Manufacturer | KLA-Tencor Corporation |
| Product series | KLA-Tencor eSxx electron-beam inspection series |
| Introduction | July 2000 |
| Inspection technology | Scanning electron-beam wafer inspection |
| Defect detection modes | Electron-beam imaging for physical defects and voltage-contrast inspection for electrical failures |
| Physical-defect sensitivity | Smaller than 100 nm under the manufacturer's launch specification |
| Production role | Production-line monitoring for sub-0.13 µm semiconductor manufacturing |
| Charging-sensitive layers | Charge-control technology supports inspection of SOI and low-k dielectric layers previously limited by charging effects |
| Inline defect classification | Inline automatic defect classification (iADC), announced in 2002 as a field upgrade and factory option |
| eDo / μLoop role | Inspection subsystem used with proprietary test structures and the μLoop Controller for voltage-contrast electrical-defect capture |
| Documented successor | KLA-Tencor eS30, introduced in May 2003 |
Product Lineage
KLA-Tencor documentation places the eS20XP between the production-oriented eS20 and the eS30 electrical-line-monitoring platform.
| Relationship | Model | Documented meaning |
|---|---|---|
| Predecessor | eS20 | Scanning e-beam wafer inspection system optimized for full-volume production; eS20XP followed with improved sensitivity and throughput. |
| Successor | eS30 | Introduced in May 2003 with improved throughput, sensitivity, and image-resolution capability. |
Brooks Automation Component Boundary
Brooks Automation identifiers such as 1-0125, 002-0921-11, and 002-9400-04 identify automation subsystems observed in eS20XP installations. They are not aliases for the KLA-Tencor eS20XP system and do not establish a universal system configuration.
Documented Production Application
A published Texas Instruments deployment documents the eS20XP in semiconductor production.
μLoop / eDo System Role
KLA-Tencor's eDo implementation combined non-contact electrical testing with inline physical-defect inspection for accelerated root-cause analysis.
Documentation Downloads
Local PDF copiesPart Photos
10 imagesHistorical archive images for identification, labels, connectors, and condition reference, not current inventory.
Historical Listings & Prices
Historical listing data, not a current offerThe typical recorded price range is $2,061.95 to $2,460.36. Based on 2 archived listing records; not a current offer, appraisal, or confirmed sale price.
View archived listing titles
- Brooks Automation 1-0125 Wafer Handling Robot KLA-Tencor eS20XP Working Surplus